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Titanium dioxide thin films deposited by electric field- assisted CVD: effect on antimicrobial and photocatalytic properties

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dc.contributor.authorRomero, Luz
dc.contributor.authorPiccirillo, Clara
dc.contributor.authorCastro, Paula M. L.
dc.contributor.authorBowman, Christopher
dc.contributor.authorWarwick, Michael E. A.
dc.contributor.authorBinions, Russell
dc.date.accessioned2016-04-21T16:52:06Z
dc.date.available2016-04-21T16:52:06Z
dc.date.issued2015
dc.description.abstractThin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA) CVD reaction of titanium isopropoxide in toluene at 450 degrees C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.pt_PT
dc.description.versioninfo:eu-repo/semantics/acceptedVersion
dc.identifier.citationROMERO, Luz; Piccirillo, Clara; Castro, Paula ML; Bowman, Christopher; Warwick, Michael E. A. Binions, Russell - Titanium Dioxide Thin Films Deposited by Electric Field- Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties. Chemical Vapor Deposition. ISSN 1521-3862. Vol. 21 (2015), p. 63–70pt_PT
dc.identifier.doi10.1002/cvde.201407145
dc.identifier.eid84924268281
dc.identifier.eissn1521-3862
dc.identifier.issn0948-1907
dc.identifier.urihttp://hdl.handle.net/10400.14/19946
dc.identifier.wos000350977900008
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherWiley-VCH Verlag
dc.subjectCatalytic propertiespt_PT
dc.subjectSemiconductorspt_PT
dc.subjectSurface propertiespt_PT
dc.subjectThin filmspt_PT
dc.subjectVapor depositionpt_PT
dc.titleTitanium dioxide thin films deposited by electric field- assisted CVD: effect on antimicrobial and photocatalytic propertiespt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.awardNumberPEst-OE/EQB/LA0016/2013
oaire.awardNumberSFRH/BPD/86483/2012
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/3599-PPCDT/PEst-OE%2FEQB%2FLA0016%2F2013/PT
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/SFRH/SFRH%2FBPD%2F86483%2F2012/PT
oaire.citation.endPage70
oaire.citation.issue1-3
oaire.citation.startPage63
oaire.citation.titleChemical Vapor Deposition
oaire.citation.volume21
oaire.fundingStream3599-PPCDT
oaire.fundingStreamSFRH
person.familyNamePiccirillo
person.familyNameCastro
person.familyNameWarwick
person.givenNameClara
person.givenNamePaula
person.givenNameMichael
person.identifier962551
person.identifier2013444
person.identifier.ciencia-id391B-75ED-6983
person.identifier.ciencia-id7C1F-6C72-354A
person.identifier.orcid0000-0002-6339-716X
person.identifier.orcid0000-0001-8841-6606
person.identifier.orcid0000-0002-9028-1250
person.identifier.ridN-8206-2013
person.identifier.ridM-8241-2013
person.identifier.ridD-7357-2014
person.identifier.scopus-author-id7004621626
person.identifier.scopus-author-id7102781782
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.nameFundação para a Ciência e a Tecnologia
project.funder.nameFundação para a Ciência e a Tecnologia
rcaap.rightsrestrictedAccesspt_PT
rcaap.typearticlept_PT
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